摘要
详细研究了用溅射法制备的Fe/Mo多层膜系统的结构、磁性及磁电阻效应(GMR).发现当保持Mo层厚度为0.8nm、Fe层厚度dFe由2.2nm减到0.4nm时,GMR在dFe<1.4nm有一迅速增加,并在dFe=0.9nm时达极大值,然后下降,矫顽力显示出类似的行为.结合磁各向异性及结构分析推断:随磁性层厚度的减薄,多层膜逐渐由连续膜过渡到不连续膜、大的GMR来源于这种微观结构的变化。
The structure, Magnetic properties and giant magnetoresistance( GMR ) of sputtering deposited Fe/Mo multilayered thin films(MLF) with Mo layer thickness of 0 8nm and Fe layer thickness ranging from 0 4 nm to 2.2 nm have been investigated systematically. It is found that with the decrease of Fe layer thicknesses, GMR increases rapidly at d Fe <1.4 nm and reaches a maximum at d Fe =0.9 nm and then decreases. Combined with magnetic anisotropy and structure analysis, it is suggested that with the decrease of Fe layer thickness, the continuous MLF will gradually become discontinuous, and then turn into a granular film. The larger GMR comes from this kind of structure variation, and it is closely related to the internally magnetic inhomogeneity of the material.
出处
《兰州大学学报(自然科学版)》
CAS
CSCD
北大核心
1996年第4期44-49,共6页
Journal of Lanzhou University(Natural Sciences)
基金
国家自然科学基金
甘肃省自然科学基金