脉冲激光沉积ZnO薄膜的结构和光学特性研究

Optical and Structual Properties of ZnO Films Grown on Si Substrate by Ecimer Pulsed Laser Deposition

采用脉冲激光，在Si（001）衬底上生长ZnO薄膜，利用X射线衍射（XRD），原子力显微镜（AFM）和光致发光光谱（PL）等测试手段研究了不同衬底温度所生长的ZnO薄膜结构特征和光学性能。研究表明：衬底温度影响ZnO薄膜结构和光学性能。在500℃～600℃沉积范围内随着温度升高，ZnO薄膜结构和光学性能提高。

ZnO films have been grown on Si（001 ） substrates using a KrF excimer pulsed laser deposition （PLD） . The microstructure and properties of the ZnO films were characterized by X - ray diffraction （XRD） , atomic force microcopy （AFM） and photoluminescence （PL） spectroscopy. It is found that the structuraland optical properties greatly depend on the substrate temperature during growth. The structural quality and optical properties of ZnO films were improved by increasing the growth temperature from 500℃ to 600℃.