用于制作小面积隧道结的悬挂光刻胶掩模

SUSPENDED PHOTORESIST MASKS FOR PREPARATING SUPERCONDUCTING TUNNEL JUNCTIONS

介绍了用悬挂光刻胶掩模制作 Pb 合金小面积超导隧道结的方法。工艺中采用光刻胶——铝膜——光刻胶的三层结构。其特点是:无须套刻对准、一次光刻,在整个制结过程中不需打开镀膜机钟罩。文中给出了悬挂光刻胶掩模和隧道结的 SEM 照片。

This paper discribes the technology of preparing Pb-alloy superconducting tunnel junctions by suspended photoresist mask. A tri-layer structure of photoresist-Al film photoresist and a technique of oblique angle evaporation have been used. The superconducting tunnel junctions including lead wires can be prepared without opening the bell-cover of vacuum coatcr.The SEM pictures of suspended photoresist mask and the tunnel junctions are also given in the paper.