湿法腐蚀进程的红外热像学研究

Study of Infrared Thermal Image in Process of Wet Etching

提出了一种研究湿法腐蚀进程的新方法———红外热像法。在湿法腐蚀中,金属或半导体基片浸泡在化学试剂中,由于化学能的作用,会在溶剂中产生热能,从而发出红外辐射,利用红外热像仪,将探测到的红外辐射信号送至计算机进行处理,得到热像图,从而可以对湿法腐蚀的进程进行分析。理论分析和实验结果都表明,红外热像法可以直观地观测到湿法腐蚀时显著的热扩散过程,从而对湿法腐蚀进程的监测、控制具有指导意义,同时也是红外技术应用的扩展。

A new method to study wet-etching process, infrared thermal image, is proposed. In wet-etching process, the substrate of metal or semiconductor is dipped in chemical reagent, and the thermal energy and infrared emission are released because of the chemical energy. The signal of infrared emission is detected and sent to computer to be processed, the infrared thermal image is obtained, and process of wet etching can be analyzed by the signal. Theoretical analysis and experimental results show that the thermal diffusion can be monitored by the new infrared thermal image method directly, which is useful for monitoring and controlling wet-etching. And it is also an expansion of infrared technology.