摘要
用双源电子束蒸发的方法,在K9玻璃基片上蒸镀Si和SiO_2的混合膜.通过改变两种膜料蒸发速率的比例,得到的各个膜层,其折射率大小在两种膜料折射率之间的范围内变化.从实验上得出了混合膜层的折射率随Si和SiO_2蒸发速率比变化的规律,并讨论了这种淀积方法的优越性.
A technology for preparing optical thin films is introduced. A Si/SiO2 mixed thin film is evaporated onto K9 glass by double source electron beam evaporation. The results show that the reflectivity index of the mixed thin film changes with the proportion of the Si and SiO2 evaporation rate,and its value changes between that of Si and SiO2. The rules between the proportion of the evaporation rates and the reflectivity index is obtained through the experiment. The advantages of the tech- nology are discussed.
关键词
薄膜
介质光学膜
双源电子束蒸发
折射率
蒸发速率
thin film
dielectric optical thin film
double source electron beam evaporation
reflectivity index
evaporation rate
