摘要
介绍了利用辉光放电光谱法分析金属材料表面的纳米级薄膜。通过优化辉光光源的放电参数,计算标准样品的溅射率。溅射率经校正后,建立各元素的标准工作曲线,从而形成了纳米级薄膜的定量表面分析方法。试验证明,此方法对膜厚的测定具有很好的准确度和精密度,可应用于多种金属材料表面纳米级薄膜的研究。
A method of glow discharge （GD） emission spectrometry for the analysis of nano film on metal surface was discribed in this paper. Analytical parameters of the GD source were optimized. The sputtering yield was experimentally determined for establishing corrected calibration curves. It was experimentally verified that the proposed method has good accuracy and precision in film thickness determination. The method has been applied to the analysis of nano film on the surface of several metal meterials.
出处
《理化检验（化学分册）》
CAS
CSCD
北大核心
2006年第9期693-698,共6页
Physical Testing and Chemical Analysis(Part B:Chemical Analysis)
关键词
辉光放电光谱法
纳米级薄膜
表面分析
Glow discharge emission spectrometry
Nano film
Surface analysis
