摘要
本文对He辉光放电清洗后的铬（Cr）表面杂质去除情况和铍（Be）样品真空出气量变化进行了实验研究。使用场发射扫描电镜和表面质量测量仪对比观察了不同放电参数处理后的Cr样品表面，结果显示在放电功率为200～300W、放电室压强为1～10Pa、清洗时间为10-20min时可较好地清除表面杂质和降低表面粗糙度；对辉光放电处理前后Be样品出气情况的实验对比结果显示，清洗后1h内总出气量约降为清洗前的1／6。
Investigates experimentally the effect of helium glow discharge cleaning（GDC）on the impuritiy removal from chromium（Cr）surface and the outgassing variation of beryllium（Be）. Cr surfaces treated in different processes have been analyzed by scanning electron microscope（SEM）and untouched 3D surface morphology analyzer, and the results showed that less surface impurities and low roughness are available under conditions of 200- 300W power excitation, 1- 10Pa pressure environment and 10-20min process duration. It reveals that the total outgassing amount in 1 hour decreases to about its 1/6 after GDC by comparing the outgassing rates of Be samples before and after GDC.
出处
《真空》
CAS
北大核心
2006年第5期39-42,共4页
Vacuum
关键词
辉光放电清洗
表面粗糙度
出气率
glow discharge cleaning
surface roughness
outgassing rate
