期刊文献+

Total Dose Radiation Tolerance of Phase Change Memory Cell with GeSbTe Alloy 被引量:1

Total Dose Radiation Tolerance of Phase Change Memory Cell with GeSbTe Alloy
下载PDF
导出
摘要 Phase change memory (PCM) cell array is fabricated by a standard complementary metal-oxide-semiconductor process and the subsequent special fabrication technique. A chalcogenide Ge2Sb2Te5 film in thickness 50hm deposited by rf magnetron sputtering is used as storage medium for the PCM cell. Large snap-back effect is observed in current-voltage characteristics, indicating the phase transition from an amorphous state (higher resistance state) to the crystalline state (lower resistance state). The resistance of amorphous state is two orders of magnitude larger than that of the crystalline state from the resistance measurement, and the threshold current needed for phase transition of our fabricated PCM cell array is very low (only several μA). An x-ray total dose radiation test is carried out on the PCM cell array and the results show that this kind of PCM cell has excellent total dose radiation tolerance with total dose up to 2 ×10^6 rad(Si), which makes it attractive for space-based applications. Phase change memory (PCM) cell array is fabricated by a standard complementary metal-oxide-semiconductor process and the subsequent special fabrication technique. A chalcogenide Ge2Sb2Te5 film in thickness 50hm deposited by rf magnetron sputtering is used as storage medium for the PCM cell. Large snap-back effect is observed in current-voltage characteristics, indicating the phase transition from an amorphous state (higher resistance state) to the crystalline state (lower resistance state). The resistance of amorphous state is two orders of magnitude larger than that of the crystalline state from the resistance measurement, and the threshold current needed for phase transition of our fabricated PCM cell array is very low (only several μA). An x-ray total dose radiation test is carried out on the PCM cell array and the results show that this kind of PCM cell has excellent total dose radiation tolerance with total dose up to 2 ×10^6 rad(Si), which makes it attractive for space-based applications.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2006年第9期2557-2559,共3页 中国物理快报(英文版)
基金 Supported by the Chinese Academy of Sciences (Y2005027), the Science and Technology Council of Shanghai (AM0517, 0452nm012, 04DZ05612, 04ZR14154, 04JC14080, 05JC14076, AM0414, 05nm05043), the China Postdoctoral Science Foundation, and the K. C. Wong Education Foundation (Hong Kong).
关键词 AMORPHOUS THIN-FILMS RANDOM-ACCESS MEMORY GE2SB2TE5 FILMS ELECTRICAL-PROPERTIES NONVOLATILE GE20TE80-XBIX IMPLANTATION TEMPERATURE TRANSITION AMORPHOUS THIN-FILMS RANDOM-ACCESS MEMORY GE2SB2TE5 FILMS ELECTRICAL-PROPERTIES NONVOLATILE GE20TE80-XBIX IMPLANTATION TEMPERATURE TRANSITION
  • 相关文献

参考文献16

  • 1Wicker G 1999 SPIE 3891 2
  • 2Lai S and Lowrey T 2001 IEEE Conference Proceedings of International Electron Devices Meeting 36.5.1
  • 3Neale R 2001 Electron. Engin. 73 891
  • 4Gosain D P, Nakamura M and Shimizu T 1989 Jpn. J.Appl. Phys. 28 1013
  • 5Bernacki S, Hunt K and Tyson S 2000 IEEE Trans. Nucl.Sci. 47 2528
  • 6Kang D He Ahn D H and Kim K B 2003 J. Appl. Phys. 943536
  • 7Bhatia K L, Singh M and Katagawa T 1995 Semicond. Sci.Technol. 10 65
  • 8Bhatia K L, Kishore N and Malik J 2002 Semicond. Sci.Technol. 17 189
  • 9Nakayama Ks Kitagawa T and Ohmura M 1993 Jpn. J.Appl. Phys. 32 564
  • 10Nakayama Ks Kojima K and Hayakawa F 2000 Jpn. J.Appl. Phys. 39 6157

同被引文献14

引证文献1

二级引证文献14

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部