摘要
文章介绍了一种用于准分子激光深层光刻实验装置的设计,并根据该设计思想进行了可行性原理实验,取得了较好的结果。
The design of experimental apparatus used for deep-etch excimer laser lithography is introduced in this paper, According to the design idea an experiment has been performed to verify its feasibility and a good experiment result has been obtained.
出处
《功能材料与器件学报》
CAS
CSCD
1996年第3期172-176,共5页
Journal of Functional Materials and Devices