摘要
本文以CPU金属刻蚀去胶腔为背景，简述干刻清洗工艺开发和评价过程。针对实际应用中的问题，展开讨论。通过实际案例分析．展示了CPU干刻清洗工艺的应用价值。
Based on ash chamber of metal etch, this paper describes the full process of dry clean development and evaluation. And the related issue among process application is also discussed. Through the analysis of actual case, the worth of dry clean application is presented.
出处
《电脑知识与技术》
2006年第10期142-144,共3页
Computer Knowledge and Technology
