纳米级精度分光路双频干涉度量系统的设计

Design and study on a nanometer order accuracy optical-path-splitting two-frequency interferometer measuration system

为完成快速、精确的外观轮廓度量,设计了一种新型纳米级精度分光路双频干涉度量系统。系统由低频差双频激光干涉度量模块和微探头及二维工作台两部分组成。微探针以轻敲式接近样品至几十纳米时,受原子力作用发生偏转,利用双频干涉模块度量其纵向偏转量,并对样品进行梳状式度量得到外观形貌。根据双频激光的实际光源,对原有双频干涉度量理论进行了改进提高。进行了系统组建和实验验证。结果表明:系统具有纳米级精度,可用于超精样品外观轮廓度量。

In order to implementation of the quick and exact surface topography detection, a novel nanometer order accuracy optical-path-splitting two-frequency interferometer measuration system was developed. The system comprises low frequencydifference two-frequency laser interferometer measuration module, micro-detection device and two dimension platform. The microprobe, approaching example surface in tap mode until several tells nanometers to surface, generates inclination because of atom force. Two-frequency interferometer module was utilized to measure longitudinal inclination. The system measured the example in honeycomb mode in order to obtain surface topography. The Two-frequency interferometer measuration theory was improved according to laser source in reality. After all, the system was put up. The experiment is actualized to verify the system performance. The experimental results show that the device has the accuracy of nanometer order, satisfies performance requirements for the superfinish surface topography detection.