摘要
对SiGe低噪声放大器(LNA)的测试技术进行了探索,开发出适合SiGe低噪声放大器的可插拔测试基座。通过对商业样品的增益G(S21)、增益平坦度、带宽、回波损耗(S11和S22)、反向隔离度(S12)1、dB压缩点(P1dB),三阶互调节点(IP3)和噪声系数(NF)等参数的测试,验证了测试系统的准确性。对所开发的单片SiGe低噪声放大器进行了测试,获得了准确的测试数据,准确表征了SiGe低噪声放大器的性能。
An investigation was made into test techniques for SiGe low noise amplifiers (LAN's). A test system with a plug-in-unit for SiGe LNA's was developed, and the accuracy of the test system was verified by testing parameters of a commercial sample circuit, such as gain G (S21), gain flatness, bandwidth, echo return loss (S11 and S22), reverse isolation (S12), 1 dB compresion point (P1dB), 3rd-order intermodulation point (IP3)and noise figure (NF). A monolithic SiGe low noise amplifier was tested, and accurate test data were obtained, which correctly characterize the performance of the SiGe low noise amplifier.
出处
《微电子学》
CAS
CSCD
北大核心
2006年第5期572-575,共4页
Microelectronics