摘要
The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-II radiation （30.4 nm） using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5°. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory （NSRL） of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.
The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-II radiation （30.4 nm） using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5°. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory （NSRL） of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.
基金
This work was supported by the National Natural Science Foundation of China (No. 60378021 and 10435050)the Program for New Century Excellent Talents in University (No. NCET-04-0376)the Science Fund of Tongji University.
