电感耦合等离子发射光谱法测定高纯金属铜中的杂质元素

Determination of Impurity Elements in High-Purity Metallic Copper by ICP/AES

利用电感耦合等离子质谱技术建立了直接测定高纯金属铜中11个杂质元素的分析方法，并研究了分析线的选择、基体的干扰、检出限的优化以及回收率的测定。方法的检出限为0．003～0．040μg／mL，回收率为94.8％～107．2％，RSD小于4．7％。结果表明，该法准确、快速、简便，应用于金属铜中杂质元素的测定，结果令人满意。

A new analytical method used for direct determination of eleven impurity elements in the high - purity metallic copper by Inductively Coupled Plasma/Atomic Emission Spectroscopy （ICP/AES） is established. The problems of selection of the analytic line, the disturbance of substrate, the optimization of detection limit and determination of recovery are researched. The detection limit of this method is 0. 003 -0. 040μg/mL,the recovery is 94. 8% - 107.2%. Relative standard deviation（RSD） is less 4.7%. The test results indicated that this method possesses advantages of accuracy, quick, convenient and others. The analytical results are satisfactory when applied in determination of impurity elements in metallic conner.