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Wollaston棱镜宽带减反射膜的研制及测试 被引量:4

Design and Test of Broad-band Antireflection Thin Films Based on Wollaston Prism
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摘要 针对Wollaston棱镜中o、e光对应的基底折射率相差较大以及制作该晶体的冰洲石和许多薄膜材料间附着力较差的特点,为了提高镀膜材料和冰洲石基底的附着力以及提高棱镜的透过比,拓宽有效使用带宽,借助于计算机辅助设计方法,设计了高性能多层减反射膜系。选用合适的光学薄膜材料,利用电子束蒸镀,借助于离子源辅助蒸镀,制作了高性能的宽带减反射膜。测试结果表明:o光的平均剩余反射率小于1.0%,e光的平均剩余反射率小于0.5%,有效使用带宽在近红外大于200 nm;薄膜和基底结合牢固,达到了设计要求,提升了棱镜的品质。 In order to improve the adhesive power of coating materials and Iceland crystal and increase the transmittance and bandwidth, we have designed a multiplayer structure broadband anti-reflecting coating. During the evaporating process ,we selected suitable optical film materials and used electron bundle to evaporate with ion source evaporating,so we obtained a broad and anti-reflecting film with high quality. The result of test indicates that the average reflection value is below 0.5 % and the effective bandwidth is the near infrared spectrum; the adhesive power of coating materials and Iceland crystal is firm and achieved the aim of design and improved the performance of Wollaston prism.
出处 《光电子.激光》 EI CAS CSCD 北大核心 2006年第10期1205-1207,共3页 Journal of Optoelectronics·Laser
基金 山东省教育厅资助项目(J05c04)
关键词 薄膜光学 WOLLASTON棱镜 减反射膜 带宽 film optical Wollaston prism anti-reflection coatings bandwidth
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  • 1杨恢东,吴春亚,赵颖,麦耀华,张晓丹,薛俊明,任慧志,耿新华,熊绍珍.氢化微晶硅薄膜制备过程中的氧污染问题[J].太阳能学报,2003,24(z1):5-8. 被引量:4
  • 2吴福全,于德洪,李国华.可调剪切差平行分束偏光器设计[J].应用光学,1993,14(6):22-24. 被引量:14
  • 3李国华.光学[M].济南:山东教育出版社,1990.32-35,463-472.
  • 4小川智哉.应用晶体物理学[M].北京:科学出版社,1985..
  • 5梁志霞 李国华.双折射滤光片-特性参数研究与优化设计[M].山东曲阜师范大学,1999.5-8.
  • 6Chen Zhiming Wang Jiannong.Basic Material Physics for Semiconductor Devices (半导体器件的材料物理学基础)[M].Beijing: Science Press,1999.326-327 (in Chinese).
  • 7Hass G, Ritter E. Optical film materials and their applications. J. Vacuum Science and Technol. , 1966, 4(2):71-79.
  • 8Arndt D P, Azzam R M A, Bennett J M et al.. Multiple determination of the optical constants of thin-film coating materials. Appl. Opt. , 1984, 23(20):3571-3596.
  • 9Zukic M, Torr D G, Spann J F a al.. Vacuum ultraviolet thin films. 1: Optica constants of BaF2, CaF2, LaF3,MgF2,Al2O3,HfO2, and SiO2.Appl.Opt., 1990, 29(28) :4284-4292.
  • 10Bennett J M, Booty M J. Computational method for determining n and k for a thin film from the measured reflectance, transmittance, and film thickness. Appl.Opt. , 1966, 5(1):41-43.

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