离子注入中污染的产生及防护

GENERATION OF AND PROTECTION FROM CONTAMINATION IN ION IMPLANTATION

本文概述了离子注入过程中污染产生的原因和防止污染的措施，特别强调了对微粒污染和金属污染的防护以满足ＵＬＳＩ加工对离子注入的要求。

The reasons of generating contamination and the measures of protection from contamination in ion implantation are summarized. The protection from metal and particle contamination is emphasized to meet the requirement of ULSI manufacture.