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氧化铟锡薄膜制备工艺参数的正交优化设计 被引量:2

Orthogonal Optimum Design of Technological Parameters for Preparation of ITO Thin Films
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摘要 利用水热的方法制备了ITO透明导电薄膜,通过正交试验设计研究镀膜工艺因素对薄膜光电特性的影响规律。试验结果表明:影响薄膜光电性能的主要因素是前驱物浓度,其次是氨水浓度和保温温度,保温时间对薄膜光电性能的影响较小。在采用前驱物浓度为0.5mol/L、氨水浓度为3mol/L、保温温度为160℃、保温时间8h的实验条件下,沉积薄膜的性能较好。 The ITO thin films were prepared by hydrothermal method and the relations between the technological parameters and its properties of optical-electrical were studied. The analysis of orthogonal experiments of technological parameters indicated that precursor concentration, ammonia concentration and hydrothermal temperature had greater influences on the properties of optical-electrical, in contrast to that of the soak time. The experiment showed when precursor concentration was 0. 5mol/L, ammonia concentration was 3 mol/L, hydrothermal temperature was 160 ℃, and soak time was 8 h, the properties of thin films were good.
出处 《液晶与显示》 CAS CSCD 北大核心 2006年第5期465-468,共4页 Chinese Journal of Liquid Crystals and Displays
基金 国家"863"计划资助项目(No.2003AA32X140) 广西"新世纪十百千人才工程"专项资金(No.2003214) 广西自然基金项目(桂科自0542011)
关键词 ITO薄膜 水热法 正交试验 ITO thin films ; hydrothermal method orthogonal experiment
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参考文献13

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