期刊文献+

ZnO基薄膜晶体管的研究 被引量:8

Study on ZnO-based Thin Film Transistors
下载PDF
导出
摘要 ZnO是一种宽带隙的光电半导体材料,能应用于很多领域,如可用在压敏变阻器、声表面波器件、气敏元件、紫外光探测等。ZnO也可以作为有源层应用于薄膜晶体管(TFT)中。ZnO基薄膜晶体管具有以下突出优势:对于可见光部分平均具有80%以上的透射率,迁移率可以高达36cm2/V·s,开/关电流比大于106,可在较低温度(甚至室温)下制备。基于这些优点,ZnOTFT具有取代有源矩阵液晶显示器中常规a-SiTFT的趋势。同时对ZnOTFT的研究也推动了透明电子学的发展。本文阐述了ZnOTFT优越的电学性能,指出了其目前尚存在的不足,并对其发展前景进行了展望。 Zinc oxide is a wide band gap optoelectronic semiconductor material, it can be applied in many fields, such as varistors, surface acoustic waves, gas sensors, UV detectors and so on. Zinc oxide can also be used in thin film transistors as an active layer. ZnO TFT has many excellent characteristics. The average optical transmission in the visible part of the spectrum is more than 80 %. The field effect mobility is as large as 36 cm^2/V· s. Ioo/Ioff, ratio is more than 106. ZnO TFT can be manufactured at a low temperature (or even at room temperature). Therefore, ZnO TFT has the potential to take the place of conventional a-Si TFT in active-matrix liquid crystal displays. Meanwhile, study on ZnO TFT has motivated considerable development on transparentelectronics. In this paper, electrical advantages, as well as some defects of ZnO TFT are described, and then an expectation of its future application is given.
出处 《液晶与显示》 CAS CSCD 北大核心 2006年第5期515-520,共6页 Chinese Journal of Liquid Crystals and Displays
关键词 ZNO TFT 迁移率 开/关电流比 有源矩阵液晶显示器 开口率 ZnO TFT mobility current on/off ratio active-matrix liquid crystal display aperture ratio
  • 相关文献

参考文献24

  • 1Carcia P F, McLean R S, Reilly M H,et al. ZnO thin film transistors for flexible electronics [J]. Mat. Res. Soc. Syrup. Proc. , 2003, 769(H7.2):1-6.
  • 2Kelly P J, Zhou Y, Postill A. A novel technique for the deposition of aluminium-doped zinc oxide films [J]. Thin Solid Films, 2003, 426(1): 111-116.
  • 3Nathan W Schmidt, Thomas S Totushek, William A Kimes,et al. Effects of substrate temperature and near substrate plasma density on the properties of dc magnetron sputtered aluminum doped zinc oxide [J]. J. Appl. Phys. ,2003, 94(9) :5514-5521.
  • 4李燕,陈希明,熊英,杨保和.溅射法生长高度取向ZnO的实验研究[J].液晶与显示,2004,19(3):174-177. 被引量:5
  • 5余旭浒,马瑾,计峰,王玉恒,王翠英,马洪磊.射频磁控溅射制备ZnO∶Ga透明导电膜及特性[J].Journal of Semiconductors,2005,26(2):314-318. 被引量:15
  • 6Chang J F, Shen C C, Hon M H. Growth characteristics and residual stress of RF magnetron sputtered ZnO: Al films [J]. Ceramics International, 2003, 29(3): 245-250.
  • 7李树玮,小池一步.ZnO材料的生长及表征[J].液晶与显示,2004,19(3):178-181. 被引量:7
  • 8Natsume Y, Sakata H. Electrical and optical properties of zinc oxide films post-annealed in H2 after fabrication by sol-gel process [J]. Materials Chemistry and Physics, 2003, 78(1):170-176.
  • 9刘博阳,杜国同,杨小天,赵佰军,张源涛,高锦岳,刘大力,杨树人.MOCVD法氧化锌单晶薄膜生长[J].液晶与显示,2004,19(2):99-102. 被引量:5
  • 10Sakai K, Kakeno T, Ikari T, et al. Defect centers and optical absorption edge of degenerated semiconductor ZnO thin films gown by a reactive plasma deposition by means of piezoelectric photothermal spectroscopy [J]. J. Appl.Phys. , 2006, 99(4) :043508(1-6).

二级参考文献72

  • 1徐毓龙,G.Heiland.金属氧化物气敏传感器(V)[J].传感技术学报,1996,9(4):93-99. 被引量:7
  • 2Minami T,Sonohara H,Takata S,et al.Highly transparentand conductive zinc-stannate thin films prepared by RF magnetron sputtering.Jpn J Appl Phys,1994,33:L1693
  • 3Siener I,Wanderka N,Urban I,et al.Electron microscopic characterization of reactively sputtered ZnO films with different Al-doping levels.Thin Solid Films,1998,330:108
  • 4Lü Jianguo,Ye Zhizhen,Zhang Yinzhu,et al.ZnO films synthesized by solid-source chemical vapor deposition with c-axis parallel to substrate.Chinese Journal of Semiconductors,2003,24(1):1
  • 5Minami T,Sato H,Nanto H,et al.Group Ⅲ impurity doped zinc oxide thin films prepared by RF magnetron sputtering.Jpn J Appl Phys,1985,24:L781
  • 6Wang Anchuan,Dai Jiyan,Cheng Jizhi,et al.Charge transport,optical transparency,microstructure,and processing relation in transparent conductive indium-zinc oxide films grown by low-pressure metal-organic chemical vapor deposition.Appl Phys Lett,1998,73(3):32
  • 7Jimenez-Gonzalez A E,Soto Urneta J A.Optical transmi-ttance and photoconductivity studies on ZnO∶Al thin films prepared by the sol-gel technique.Solar Energy Materials and Solar Cells,1998,52:345
  • 8Ma Jin,Ji Feng,Zhang Deheng,et al.Optical and electronic properties of transparent conducting ZnO and ZnO∶Al films prepared by evaporating method.Thin Solid Films,1999,347:1
  • 9Hu J H,Gordon R G.Atmospheric pressure chemical vapor deposition of gallium doped zinc oxide thin films from diethyl zinc,water and triethyl gallium.J Appl Phys,1992,72:5381
  • 10Zhang D H,Brodie D E.Transparent conducting ZnO films deposited by ion-beam-assisted reactive deposition.Thin Solid Films,1992,213:109

共引文献41

同被引文献105

引证文献8

二级引证文献32

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部