化学气相沉积法制备光谱选择性碲膜

Preparation of tellurium films with spectral selectivity by chemical vapour deposition method

用化学气相沉积法制备碲薄膜,其步骤为：通过电化学方法制得碲化氢,碲化氢在室温下分解后在聚乙烯塑料箔上沉积得到碲薄膜.用傅里叶红外光谱仪、紫外/可见/近红外光谱仪、X射线衍射仪及扫描电镜表征碲薄膜的光学性能和结构.结果表明,化学气相沉积法在Mn-O覆盖的聚乙烯塑料箔上沉积得到的碲薄膜在大气窗口（8～13μm）光谱区域具有很高的透过率,同时能阻挡几乎所有的太阳光谱,表明碲薄膜是适用于辐射制冷装置的太阳光辐射屏蔽材料.

Thin film of tellurium was prepared by chemical vapour deposition on the polyethylene foils using room-temperature decomposition of electrochemically generated hydrogen telluride. The optical and structural characterizations of the tellurium films were performed by means of FTIR spectroscopy, UV/Vis/NIR spectroscopy, X-ray diffraction and scanning electron microscopy. The results show that the tellurium films on the Mn-O coated polyethylene foils exhibit high transmission in the atmospheric window region（8- 13 ttm） and are highly blocking in the solar spectral region, showing that the tellurium films are suitable to be used as solar radiation shields in a radiative cooling device.