期刊文献+

多弧离子镀技术及其应用 被引量:47

Technology and Application of Multi-Arc Ion Plating
下载PDF
导出
摘要 多弧离子镀技术是离子镀技术的一种改进方法,它是把弧光放电作为金属蒸发源的表面涂层技术.由于多弧离子镀技术具有镀膜速度高,膜层的致密度大,膜的附着力好等特点,使多弧离子镀镀层在工具、模具的超硬镀膜、装饰镀膜等领域的应用越来越广泛,并将占据越来越重要的地位.介绍了多弧离子镀技术的原理、特点,并在总结和归纳了以往大量实验研究及国内外文献的基础上,分析了多弧离子镀技术的工艺发展及其在各个领域的应用,为今后多弧离子镀技术的研究与应用提供了有利借鉴. Multi-Arc Ion plating technology is an improved method of Ion plating and it is a surface coating technology that uses arc as the fountain of vaporizing. It plats rapidly with fine-tissued coat. It can be applied to many aspects such as high-rigidity coating of tools and mould and decoration coating more widely and occupy a more important place. This paper introduces the principle and characteristics of multi-arc ion plating, and on the conclusion of many studies and experiments done in the previous years, this paper also analyses the development and application of multi-arc ion plating technology in some areas. It will offer favorable reference for the study and application of multi-arc ion plating technology in future.
出处 《重庆大学学报(自然科学版)》 EI CAS CSCD 北大核心 2006年第10期55-57,68,共4页 Journal of Chongqing University
基金 机械传动国家重点实验室访问学者项目
关键词 镀膜 多弧离子镀 氮化钛 multi-arc ion platine coating TiN
  • 相关文献

参考文献25

  • 1胡传.表面处理技术手册[M],北京:北京工业大学出版社,1997.409
  • 2KAMAR N. Failure Mechanisms of TiN Thin Film Diffusion Barriers [ J ]. Thin Solid Films, 1988,164:417 - 420.
  • 3MATTAX D M. Particle Bombardment Effects on Thin Film Deposition: A Review [ J ]. J Vae Sci Teehnol, 1989,17(3) :1 105 -1 110.
  • 4TANAKA Y,GUR T M. Properties of( Ti, XAIX) N Coating for Cutting Tools Prepared by the Cathodic Arc Ion Plating Method[J]. J Vac Sci Technol ,1992 ,10(4) :1 749 -1 756.
  • 5WANG Y K, XIA L F, LEI T O, et al. A Research on Microstructure and Properties of ( Ti, A1 ) N Coating [ J ]. Surf & Coat Technol , 1995,72:71 - 75.
  • 6SANCHETTE F, CZERWIEC T. Sputtering of AI - Cr and Al- Ti Composite Targets in Pure Ar and in Reactive Ar-Cr Plasmas [ J ]. Surf & Coat Technol , 1997,96 : 184 - 190.
  • 7曾凤章,徐新乐,吴玉广.多弧离子镀膜工艺的技术开发[J].北京理工大学学报,1999,19(1):127-132. 被引量:10
  • 8周细应,万润根,陈凯旋.TiN涂层的正交设计工艺分析[J].热加工工艺,1996,25(4):22-23. 被引量:4
  • 9王福贞,闻立时.表面沉积技术[M].北京:机械工业出版社,1989.5~10.
  • 10薛钰芝,林纪宁,周立梅,李明浩,郭文有.氮分压对 TiN 离子镀层影响的研究[J].大连铁道学院学报,1998,19(1):25-29. 被引量:3

二级参考文献29

共引文献150

同被引文献517

引证文献47

二级引证文献158

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部