LiB_3O_5晶体946nm,473nm倍频增透膜的研制

Study and Manufacture of Frequency Doubling Antireflection Coating at 946nm and 473nm for LiB_3O_5 Crystal

采用离子辅助沉积技术在L iB3O5晶体上制备了946nm,473nm倍频增透膜,并测量了薄膜的性质。测试结果表明,该增透膜具有较低的剩余反射、高的环境稳定性和良好的附着力。进一步测量了薄膜在波长1064nm多脉冲辐照下的激光损伤阈值,获得了两种不同的损伤形貌,并对损伤原因作了初步的探讨。此工艺下镀制的L iB3O5晶体用于瓦级全固态蓝光激光器,获得了3.8W波长为473nm的连续蓝光输出。

Frequency doubling antireflection coatings at 946nm and 473nm were deposited for LiB3O5 crystal with ion assisted deposition. The measurement indicates the coatings have low residual reflection, good adhesion and high environmental stability. Laser induce damage threshold by multiple-shot irradiation at 1064nm was studied and two typical damage morphologies were obtained. LBO devices coated on both facets with ion assisted deposition are satisfied with the use for CW Watt-level All-solidstate 473nm blue laser. The maximum laser output power of 3.8W has been achieved at 39W of pump power.