低温沉积ITO膜的透光率及电磁屏蔽特性的研究

Transmittance and Electromagnetic Shielding of ITO Films Deposited at Low Temperature

采用射频磁控溅射技术,在水冷的有机玻璃(PMMA)和聚乙烯对苯二甲酯(PET)柔性膜上,低温沉积ITO薄膜。研究了膜厚对其形貌、光电以及电磁屏蔽特性的影响。结果表明,表面形貌随膜厚的增加有明显变化,进而对样品的光电性能产生明显影响,可见光平均透光率在75%~86%,电阻率在1×10-3Ω.cm^3×10-3Ω.cm范围内变化;其样品的总屏蔽效能也随着膜厚的增加而逐渐增大。通过适当调节膜厚,可分别实现样品最大平均透光率86.41%,最小电阻率1.19×10-3Ω.cm,最大屏蔽效能超过15 dB。

ITO films were deposited at room temperature on water-cooled polymethylmethacrylate （PMMA） and polyethylene terephthalate （PET） substrates by RF magnetron sputtering. The ITO films were characterized with X-ray diffraction （XRD） and atomic force microscopy （AFM） .The results show that the ITO film thickness significantly affects its characteristics,including its surface microstructures, its optical properties and its electromagnetic shielding. For example, as the film thickness increases, its surface roughness and compactness change a great deal;its averaged transmittance and resistivity vary from 75% to 86% and 1 × 10^-3 Ω ·cm to 1 × 10^-3 Ω ·cm, respectively. In addition,the shielding of the samples improves with the increase of the film thickness. High quality ITO films, with a high averaged visible transmittance of 86.41 %, a low resistivity of 1.19 × 10^-3 Ω ·cm and good electromagnetic shielding have been successfully grown by carefully controlling the film thickness.