循环伏安溶出法研究镀镍添加剂的整平作用

Study on the Levelling Power of Additives in Bright Nickel Plating by Cyclic Voltammetric Stripping

本文利用旋转圆盘电极上的循环伏安溶出法研究光亮镀镍液添加剂的整平能力.电流效率随电极转速的增加而降低是添加剂具有整平性能的一个显著标志.本法测得的整平能力包括了添加剂对金属离子析出的阴极极化和对阴极电流效率的影响,因而反映了添加剂的实际效能.电极的转速对整平能力的测定结果影响很大.实际测定时电极转速宜控制在2000到3000rpm之间.电位扫描速度也对整平能力的测定结果有影响.实际测定宜用较小的电位扫描速度,例如20mv/s以下.

The levelling power of additives for bright nickel plating was investigated and determined using cyclic voltammetric stripping (CVS) at a rotating disc electrode (RDE). The rotating speed of the RDE and the potential sweep rate were found to have significant effects on the results. The reasons for this were discussed and best conditions for the determination of levelling power by CVS at RDE were experimentally established.