薄膜内应力的起源

Origin of Internal Stress in Thin Films

薄膜内应力的存在是薄膜生产、制备过程中的普遍现象。应力的产生与薄膜的成核、生长以及微观结构密切相关。本文综述了目前已提出的各种有关应力起源的理论模型,并对磁控溅射 Co-Cr 和 Gd-Fe 二元合金薄膜的应力产生机制进行讨论。

The existence of stress in thin films is a general phenomenon in the produc- tion and preparation of various films.The origin of stress is closely related to the nucleation, growth and microstructure of thin films.In this paper,various proposed theoretical models for the origin of stress are summarized,and the research results about the stress in Co-Cr and Gd-Fe binary alloy films deposited by magnetron sputtering are discussed briefly.