摘要
用W粉和Ti粉作原料, 采用惰性气体热压法制备W/Ti合金靶材. 研究了靶材致密性、富Ti的β相含量、微观结构均匀性与工艺条件的关系. 结果表明, 控制温度在1250～1450 ℃之间, 压力在20 Mpa左右, 保温时间在30 min左右可制备高性能的W/Ti合金靶材.
W-Ti targets were fabricated by inert gas hot press method. The target characteristics including relative density, microstructure, content of Ti rich /3 phase were introduced. The relationship between target characteristic and technical conditions was researched. The results show that under the condition of temperature range of 1250 - 1450℃, hot press about 20 MPa and heat preservation time about 30 min, good quality target can be fabricated.
出处
《稀有金属》
EI
CAS
CSCD
北大核心
2006年第5期688-691,共4页
Chinese Journal of Rare Metals
基金
国家自然科学基金资助项目(50501003)
国家科技攻关资助项目(2004DFBA0003)
关键词
溅射靶材
W/Ti合金靶材
扩散阻挡层
热压
sputtering target
W-Ti alloy target
diffusion barrier layers
hot press
