偏压对CrTiAlN镀层组织形貌及磨损性能的影响

Influence of bias voltage on morphology,phase and wear performance of magnetron sputtered CrTiAlN coatings

利用闭合场非平衡磁控溅射离子镀技术制备了耐磨CrTiAlN镀层,分析了溅射偏压对该镀层的形貌、相结构以及磨损性能的影响。研究表明:偏压对镀层的形貌、相结构以及与摩擦学性能有关的摩擦系数、硬度、结合力以及磨损率等参数都有影响。在制备CrTiAlN镀层的过程中,当偏压为-75V时镀层的耐磨损性最好,当偏压在-65V--85V变化时,镀层形貌的变化对镀层的磨损性能无明显影响,CrTiAlN镀层相结构的变化是影响磨损性能的主要原因。

The effect of bias voltage on morphology,phase components and wear performance of CrTiAlN coating,which was deposited by closed field unbalanced magnetron sputtered ion plating technique,was studied.The results show that the morphology and phases of the coating as well as the tribological parameters such as fiction coefficient,hardness,adhesion and wear rates of the coating are varied with bias voltage.The minimum wear rate of the coating prapared in bias voltage of-75V is obtained.And the conclusion can be obtained that the key factor which the influences the wear performance of the coating is not its morphology but the phase components when the bias voltages are in the range of-65V to-85V.