Bi_4Ti_3O_(12)薄膜的结构与形貌分析

ANALYSIS OF THE STRUCTURE AND THE PHYSIOGNOMY OF THE Bi_4Ti_3O_(12)FILM

采用金属与金属氧化物复合靶的射频溅射法,在S_1,Au,Pt和Ti基片上沉积制备Bi_4Ti_3O_(12)(BTO)铁电薄膜,对不同基片沉积的BTO薄膜,以及不同退火温度下的薄膜的相结构、成分及形貌进行了分析。结果表明,BTO薄膜的结构与退火温度和沉积基片有关,不同基片上钙钛矿结构形成的温度按T_t<S_t<Au<Pt递增,SEM形貌观察也得到证实。

Bi4Ti3O12(BTO) ferroelectric films have been prepared on Si,Au, Pt and Ti substrates rspectively by RF sputtering of metal and metal oxide composed target. The phase structure, composition and physiognomy of the BTO films on different substrates and different annealing temperatures were respectively analysizecl. The results showed that the structure of BTO film depended on the substrate and the annealing temperature, and the temperature of getting perovskite-type BTO film on different substrates were different (Ti< Si<Au<Pt). And the results of physiognomy observation were also verified by SEM.