溅射NiOx电致变色薄膜器件电化学特性测试

Measurement of the Electrochemical Properties of Sputtered NiO x Electrochromic Film Devices

介绍了一个以单片计算机和ＰＣ机组成的电致变色器件电化学特性测试系统．采用直流溅射的方法制备了Ｎｉ（ＯＨ）２薄膜，并且进行了循环伏安特性、注入薄膜中电荷总量和时间的关系、光密度变化和注入电荷总量的关系及驱动电流和时间的关系测试．发现随着注入电荷量的增加，开始光透过率的变化呈线性变化，当注入电荷量较大时出现饱和趋势．

A measuring system for the electrochemical properties of electrochromic devices is described. The electrochromic Ni(OH) 2 film is prepared by DC sputtering. Tests on the current characteristic and the relations between the time and the charge variation of the optic density have been carried out. It has been found that the optic transmission exhibits a linear change under moderate charge injection and tends to be saturated under higher injection. The results obtained are in agreement with those by conventional test equipment while the manipulation and data processing are greatly simplified.