用于红外焦平面的微透镜阵列单片制备技术

The Monolithic Preparation for an IRFPA Microlens Array

提出了离子束刻蚀制备微透镜阵列的工艺原理；研究了球面型光致抗蚀剂掩膜的形成过程以及硅微透镜离子束刻蚀的实验条件．表面探针测量及扫描电子显微镜（ＳＥＭ）实验证明了该技术可在较低的衬底温度下（低于２００℃）有效地制备出球面型微透镜，并用表面探针测量确定了硅微透镜的尺寸．

The Preparation process for a microlens array using ion beam milling is proposed and the formation of photoresist masks of spherical shapes and the experimenting conditions of the etching for silicon microlenses are studies. It has been proved by surfice stylus measurement and scanning electron microscopy (SEM) that the microlens array can be well prepared at low substrate temperatures of less than 200℃. The size of the silicon microlenses is determined by surface stylus measurement.