摘要
在半导体业中,对生产作业环境要求极为严格,其中对AMC(AirborneMolecularContami-nation)有更严格的控制要求。SO2和NH3属于AMC中的2种,即MA(分子酸)和MB(分子碱)。主要讨论洁净室中NH3和SO2的含量对晶圆和光罩的影响,以及采取各种有效措施对其进行控制,满足先进制程对于产品生产的超高空气品质要求。
In semiconductor industry, it is very critical to control operation environment, especially about AMC control. SO2 and NH3 are the two kinds of AMC, namely MA and MB. This paper will dis- cuss the effect of NH3 and SO2 to the wafer and masks, and some effective action to control them in order to provide high quality Clean Room Environment to meet the advanced the process requirement.
出处
《电子工业专用设备》
2006年第11期19-23,共5页
Equipment for Electronic Products Manufacturing
