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平面行星夹具的物理气相沉积均匀性计算 被引量:5

Numerical Simulation of a Flat Planetary Fixture for Physical Vapor Deposition
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摘要 建立了平面行星夹具薄膜淀积无量纲模型,通过对蒸发源位置L/H、行星主轴与副轴距离P/H、夹角倾角A以及蒸发源蒸汽发射特性N等因素的分析,得到了典型径向理论均匀的优化几何配置.并从优化几何配置的膜料效率、角向均匀性和膜厚分布对蒸发源蒸汽发射特性变化的敏感性方面评价优化结果,得到了最优化设计区域.结果表明,优化配置的L/H+P/H小,则角分布差异小;L/H+P/H和A小,则膜料效率高;L<P,A=-15°时,优化配置对N变化最不敏感;L>P时,由N变化引起的典型径向分布变化小于0.5%. A thin film deposition dimensionless model for flat planetary fixture is developed. Optimal geometric configurations with theoretical representative radial uniformity are acquired by analyzing the evaporating source location LIH, the distance between the main axis and the secondary axis PIH, the slope angle of fixture A and the emissive characteristics of vapor source N. An optimum design zone is shown by evaluating optimal geometric configurations with coating materials efficiency, angular uniformity and emissive characteristics sensitivity. The results indicate that the thickness via angular distribution is more uniform as LIH + PIH is small and the coating material efficiency is higher when both LIH + PIH and A are small; As L 〈 P and A = - 15deg, the optimal geometric configurations are more insensitive to N; As L 〉 P, the change of the representative radial distribution due to the change of the emissive characteristics is less than 0.5 %.
出处 《计算物理》 EI CSCD 北大核心 2006年第6期738-742,共5页 Chinese Journal of Computational Physics
关键词 薄膜淀积 均匀性 平面行星夹具 计算机模拟 physical vapor deposition uniformity flat planetary fixture computer simulation
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  • 1潘栋梁,熊胜明,张云洞,王任华.行星夹具膜厚均匀性计算[J].强激光与粒子束,2000,12(3):277-280. 被引量:23
  • 2Perrin A, Gailliard J P. Planetary system for high-uniformity deposited layers on large substrates[ A].//Thin Films for Optical Systems[M]. Guenther K H, ed, Proc SPIE 1782, 1992, 238-244.
  • 3Graper E B. Distribution and apparent source geometry of electron-beam heated evaporation sources[J]. J Vacuum Sci Techno, 1973,10:100 - 3.

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