SIMS在碲镉汞红外焦平面探测器工艺中的应用

The Applications of SIMS Technology in the MCT IRFPA Processing

文章介绍了二次离子质谱仪的结构及其基本工作原理,并通过对典型应用的分析,介绍了二次离子质谱分析技术在高灵敏度碲镉汞红外焦平面探测器材料和器件制备工艺中的作用,特别是在结探监测和微量杂质监控方面所发挥的重要作用。

In the paper the structure and principle of the secondary ion mass spectrometry （SIMS） are reported, and its typical applications in the HgCdTe material and devices processing, especially in the measurement of the junction depth and the quantity analysis of trace impurity are introduced.