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光致酸发生剂——对甲基苯磺酸三苯基硫盐的合成 被引量：2

Synthesis of the Photoacid Generator——Triphenylsulfonium Tosylate
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摘要 以二苯亚砜为起始反应物,通过改进反应溶剂,首先合成了溴化三苯基硫盐,大大缩短了反应时间,提高了该盐的反应收率.再运用银盐置换法,合成了光致酸发生剂——对甲基苯磺酸三苯基硫盐,并对其进行了红外和核磁共振表征. The triphenylsulfonium bromide was synthesized from the original reactant biphenyl sulfoxide with the improvement of the solvent medium. The reaction time was greatly shortened and its yield was boosted. Then the photoacid generator（PAG） triphenylsulfonium tosylate was synthesized by silver salt replacement. Its FT-IR and ^1H NMR spectra were tested.
作者 李萍 李平 刘建国
机构地区 华中科技大学化学系
出处 《感光科学与光化学》 EI CSCD 2006年第6期450-453,共4页 Photographic Science and Photochemistry
关键词 光致抗蚀剂 光致酸发生剂 对甲基苯磺酸三苯基硫鎓盐 photoresist photoacid generator triphenylsulfonium tosylate
分类号 O625.7 [理学—有机化学]
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参考文献13

  • 1王文君.化学增幅抗蚀剂用光产酸剂——硫鎓盐的合成方法[J].中国环境管理干部学院学报,2005,15(2):55-58. 被引量：2
  • 2James F C,Timothy A,Arturo J O,et al.Complex triarylsulfonium salts as photoacid generators for Deep UV microlithography:synthesis,identification and lithographic characterization of key individual components[J].Proc.SPIE,1997,3049:473-484.
  • 3Toshikage A,Hitoshi Y,Akira M,et al.A novd photoacid generator for chemically amplified resists[J].Proc.SPIE,2003,5039:1155-1163.
  • 4Hitoshi Y,Toshikage A,Tobias H,et al.Novel non-ionic photoacid generator releasing strong acid for chemically amplified resists[J].Proc.SPIE,2004,5376:103-114.
  • 5王文君,李华民,王力元.一种适用于193nm光刻胶的硫盐光产酸剂的制备与性质[J].感光科学与光化学,2005,23(1):48-54. 被引量：10
  • 6刘安昌,莫健华,黄树槐,邹菁.二苯亚砜与芳香化合物缩合制备芳基取代硫鎓盐的研究[J].化学世界,2005,46(7):424-427. 被引量：1
  • 7Seiichi T,Seiiji N,Toshiiyuki I,et al.Radiation and photochemistry of onium salt acid generators in chemically amplified resists[J].Proc.SPIE,2000,3999,204-213.
  • 8Nigel P H,Kevin M W.Mechanistic studies on the poly(4-tert-butoxycarbonyloxystyrene) / triphenylsulfonium salt photoinitiation process[J].Proc.SPIE,1991,1466:384-393.
  • 9John L Dektar,Nigel P Hacker.Photochemistry of trisrylsulfonium salts[J].J.Am.Chem.Soc,1990,112:6004-6015.
  • 10Jams F C,Sheri L A,Xu G,et al.Impact of photoacid generator structure on DUV resist performance[J].Proc.SPIE,1999,3678:85-99.

二级参考文献21

  • 1王文君,李华民,王力元.一种适用于193nm光刻胶的硫盐光产酸剂的制备与性质[J].感光科学与光化学,2005,23(1):48-54. 被引量：10
  • 2Allen R D, et al. Progress in 193 nm single layer resists: the role of photoacid generator structure on the performance of positive resists [ C]. In: American Chemical Society Symposium Series, Microand Nanopatterning Polymers,1998,706: 224-236.
  • 3Nalamasu O, Houlihan F M, et al. 193 nm single layer resist strategies and resent results[J]. J Vac Sci Technol B, 1998,16(6): 3716.
  • 4Shigeyuki Iwasa, Ichiro Nakano, Atsumi Maeda, et al. Design of transparent and thermally stable photo-acid generators for 193 nm lithography[J]. J Photopolym Sci Technol , 2000,13(2) :235-236.
  • 5Hiroyuki Ishii, Hinji Usui, Atsuji Dould, et al. Design and lithographic performances of 193-specific photoacid generators[C]. In:Proc. SPIE , Advances in Resist Technology and Processing XVII , 2000,3999:1120-1129.
  • 6Masamitsu Shirai, Masahiro Tsuncoka. Photoacid and photobase generators: chemistry and applications to polymeric materials[J], Prog Polym Sci , 1996,21:1-45.
  • 7Crivello. Initiator compositions and methods for their synthesis and use[P]. US Patent ,6 031 014. 2000-02-29.
  • 8Tom Kajita, et al. Highly-efficient photoacid generators for ArF resiet[J ], J Photopolym Sci Technol, 2000,13(4) : 625-628.
  • 9Tohru Ushirogouchi, et al. Molecular design of acid generators for EB and ArF excimer laser exposure using molecular orbital calculations[J]. J Photopolym Sci Technol , 1994,7(3) :423-432.
  • 10Alan L Maycock, et al. Photochemical reactions of phenacyl- and benzylsulfonium salts[J ]. J Org Chem, 1970,35 (8) : 2532-2539.

共引文献10

同被引文献40

  • 1徐俊伟,陈德铨,史素青,聂俊.三芳基硫鎓盐的合成及光引发阳离子聚合反应[J].信息记录材料,2006,7(1):34-37. 被引量：1
  • 2杨幸幸,邹应全,张站斌.三嗪类产酸剂的合成及表征[J].信息记录材料,2007,8(3):18-20. 被引量：1
  • 3Scherzer T,Decker U.The effect of temperature on the kinetics of diacrylate photopolymerization studied by Realtime FTIR spectroscopy[J].Polymer,2000,41:7681-7690.
  • 4Sangermano M,Malucelli G,Priola A,et al.Carbazolc derivatives as photosensitizers in cationic photopolymerization of clear and pigmented coatings[J].Eur.polym.J.,2005,41:475-480.
  • 5Wang ToMa L J,Wan P Y,et al.A study of the photoactivities andthermomechanical properties of epoxy resins using novel[cyclopentadien-Fe-arenel"[J].J.Photochem.Photobiol.,A,2004,163:77-86.
  • 6Tarrant P, Lilyquist M R, Lovelace A M, et al. Polyfluori- nated 1,3- diene having fluoroine substituents in 1,1,2 - position, their polymers, and methods for making the same: US, 3562341 [ P]. 1971 -02 -09.
  • 7Okada, Satoshi O, Daisuke O, et al. Preparation of mal. ononitrile compound and use thereof as pesticides: WO, 2004020399 [ P ]. 2004 - 03 - 11.
  • 8Huebl D, Pieroh E, Joppien H. S - Substituted 1,3,4 - th- iadiazole derivatives their preparation and their use as pesti- cides: EP, 41055[P]. 1991 -01 -30.
  • 9渡边幸喜,石川幸一,大津悠一,等.杀线虫的三氟丁烯化合物:CN,1359379[P].2002-07-17.
  • 10Watanabe. Preparation of nematocidal trifluorobutenyl imid- azolyl thioether derivatives : WO, 2003049541 [ P]. 2003 - 06 - 19.

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感光科学与光化学
2006年 第6期

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