摘要
采用溶胶凝胶法浸渍提拉工艺制备透明导电膜,并考察了Sb3+的掺杂量、膜的厚度、热处理温度对薄膜电阻的影响,以及不同的处理方法对薄膜透过率的影响,制得透明导电膜的电阻率最低可达ρ=16×10-3Ω·cm,薄膜连续性、致密性好,平均透光率达到90%以上。对所制备的透明导电膜用XRD、FT-IR、SEM、TEM进行了分析表征。
Transparent conductive film was prepared by dip coating method with sol-gel. The effects of Sb-doped＇ s amount, thickness of the film and heat treatment temperature on resistance of the conductive film were studied, and the effect of different process methods on film＇ s transmittance was studied as well. Transparent conductive film were characterized by XRD, FT-IR, SEM, TEM. The results showed that a good continuous and dense transparent conductive film was obtained with surface resistance down to ρ = 16 × 10^-3 Ω·cm and mean transmittance up to 90%.
出处
《中国陶瓷》
CAS
CSCD
北大核心
2006年第11期18-20,23,共4页
China Ceramics
