摘要
本文利用国际上近几年发展起来的一种新型显微成像工具──扫描电子声显微镜(SEAM-ScanningElectronAcousticMicroscope)对几种类型的半导体材料进行了电子声成像观察与研究.文中简述了扫描电子声显微镜的电子声成像机理和其工作原理.从获得的电子声图像上,反映出扫描电子声显微成像技术在对半导体材料的亚表面缺陷和掺杂分布方面有着直接观察与显示的能力.同时与相应位置所获得的二次电子像进行了比较,显示出了电子声显微成像技术的独特之处和潜在的应用价值.
Abstract Observations and research have been made to semiconductor materials with a novel imaging technique──Scanning Electron Acoustic Microscope(SEAM) on a microscale.The mechanism of the electron acoustic imaging and the principle of the operation are simply described. The ability of SEAM to observe subsurface and doping distribution in semiconductor materials has been shown by comparing the electron acoustic images with secondary electron images. The results show that the SEAM has its own advantages over SEM and potential applications.
基金
"863"高技术资助
国家自然科学基金