离子束溅射铂膜沉积速率的温度效应

Deposition Rate of IBS Deposited Pt Films at Different Substrate Temperatures

实验研究了离子束溅射铂膜的沉积速率与溅射功率、基片温度之间的关系。结果表明基片温度对沉积速率有明显的影响．沉积速率随基片温度的上升而增大。利用吸附理论对此现象进行了探讨。

The investigation of the paper includes the measurements of the deposition rate ofPt films deposited by ion- beam sputtering at different deposition parameters andtemperatures. It was found that deposition rate increases with the increase of the substratetemeperature. Using the physical and chemical adsorption theory, we discussed thisphenomenon.