摘要
γ-LiAlO2与GaN的晶格失配很小,易于分离,在其(100)面上能生长出无极性的GaN,是一种很有希望的GaN衬底材料。结合γ-LiAlO2的基本性质,详细介绍了γ-LiAlO2衬底上用各种方法生长GaN的研究进展。
γ-LiAlO2 as a very promising substrate, shows small lattice mismatch with GaN and can separate from GaN easily. Most importantly, nonpolar M-plane GaN can be grown on γ-LiAlO2 (100) plane. Combined with basic properties of γ-LiAlO2 the research deyelopmants of GaN grown on γ-LiAlO2 substrate by different methods are reviewed in detail.
出处
《激光与光电子学进展》
CSCD
北大核心
2006年第12期36-41,共6页
Laser & Optoelectronics Progress
基金
上海市浦江计划(05PJ14100)
中科院百人计划资助项目。