任意偏振态光束全反射时的侧向和横向位移

Lateral and Transverse Shift of Arbitrarily Polarized Beam in Total Internal Reflection

光束在电介质界面发生全反射时,实际反射光束会在入射面内相对于几何反射光束产生一侧向位移,在垂直于入射面的方向产生一横向位移。利用改进的能流法研究了任意偏振态光束发生全反射时的侧向和横向位移特性。研究表明,侧向位移的大小与入射光束的两组成部分———TE和TM偏振光的相位差无关,而与两组分的光强比密切相关,且该位移可以表示为TE和TM偏振光束各自的位移按光强的加权平均。横向位移的大小不仅与入射光束两组分的光强比相关,还与组分的相位差密切相关。另外,反射光束不仅在椭圆偏振态入射的情况下会产生横向位移,而且在TE和TM偏振态之外的其他线偏振态入射时,也会产生横向位移。

The totally reflected beam by a dielectric interface actually exhibits a lateral shift from the position of geometric reflection in the plane of incidence, and a transverse shift normal to the plane of incidence. The lateral and transverse shift of an arbitrarily polarized beam is investigated by the improved energy flux method. It is shown that the lateral shift is independent of the phase difference of the TE and TM components of the incident beam, but closely associated with the light intensity of the two components, and its form can be expressed as weighed average of the shifts of the TE and TM polarized beam in accordance with their light intensity. The transverse shift is not only dependent on the light intensity of the two components, but also closely asscociated with the phase difference of the components. Besides, whether the incident beam is elliptically polarized or linearly polarized（ with polarization state other than TE or TM）, the reflected beam will exhibit a transverse shift.