电镀非晶态镍钨合金工艺研究

Electroplating Process of Amorphous Nickel-Tungsten Alloy Coating

研究了电镀非晶态镍钨合金工艺，采用EDS、XRD等手段检测了镍钨合金镀层，并将工艺条件如电流密度，镀液pH值、镀液温度等对镀层的影响进行了比较，得出非晶态镍钨合金电镀的最佳工艺：[W]／（[W]＋[Ni]）为0．6～0．8，Jc=6．0-12．0A／dm^2，温度55～65℃，pH=6．5～7．5。结果表明，W含量质量分数高于44％的镍钨合金镀层结构为非晶态；且在此工艺下易得到钨含量在44％以上的非晶态钨合金镀层。

The electroplating process of amorphous Ni-W alloy coating was studied and optimized. Thus the effects of current density and the pH value and temperature of the plating bath on the composition and microstructure of the alloy coating were investigated , based on analyses of the composition and microstructure of the coating using energy dispersive spectroscopy and X-ray diffraction. It was found that the titled alloy coating with satisfactory composition and microstructure could be prepared by electroplating al a current density of 6. 0 - 12. 0 .A/dm2, bath temperature of 55-65 X. , and bath pH value of 6.5-7.5, with the ra-tio of W ions concentration to that of W ions plus Ni ions to be 0.6-0.8.