钛基多孔氧化锡纳米结构的制备

Fabrication of Tin Oxide Porous Nanostructures on Titanium by Anodization and Electroplating

研究了采用电沉积和阳极氧化方法在钛基上制备多孔氧化锡纳米结构的技术.在3mm厚的钛片上,采用电沉积的方法首先预沉积镍层,然后沉积1μm厚高纯度锡膜作为阳极浸入0·5mol/L草酸溶液中,在直流恒压5V条件下,进行电化学氧化5min.电化学氧化处理后,分别采用扫描电镜和X射线衍射仪对样品进行了平面、横断面形貌观察和氧化产物分析.结果表明,在钛基上形成了一层厚约1μm、孔径70nm、孔间距80nm的多孔氧化亚锡薄膜,这种多孔结构薄膜可以进一步在空气中加热500℃处理2h,制成钛基氧化锡多孔材料,它也可作为制备钛基纳米复合材料的模板.

A tin dioxide nanotube is fabricated on titanium by anodization and electroplating. First,a nickel film is deposited on 3mm-thick titanium. Then a lμm-thick tin layer is deposited thereon by electroplating. The wafer is anodized for 5min in 0.5mol/L oxalic acid solution,at constant DC 5V at room temperature. After the anodization, to enlarge the pore size and remove the barrier layer,the anodized specimens are immersed in a 1.0mol/L oxalic acid solution for 15min at 80%. The obtained samples are examined by scanning electron microscopy,EDS, and X-ray diffraction. The results indicate that a layer of nano-pore arrays of tin oxidation, whose thickness is about lμm, formed on the titanium. The pore diameter is 70nm. The distance between two adjacent pores is 80nm. The sample is heated to 500% for 2h to fabricate SnO2 compound and is used for the fabrication of composite coating on titanium also.