摘要
提出了将激光辅助化学刻蚀技术应用于钇钡铜氧(YBCO)高温超导薄膜的刻蚀,研究了无掩膜YBCO薄膜激光化学刻蚀的表面特性及其变化规律,在激光辐照下,YBCO薄膜的液相刻蚀速率大大加快,并且在整个过程中,刻蚀速率呈现加快趋势,这一特性将有可能用于改善YBCO刻蚀中的横向钻蚀情况,并提高图形边缘的侧壁陡峭度。
The laser assisted chemical etching was proposed to apply in the etching of YBCO high temperature superconductor film. The etched surfaces characteristics and variations were studied. The wet etching speed of YBCO film was accelerated drastically under the laser radiation and increased for over the time. There was no strict distinction at the edge of laser facula and the surface etching degree of YBCO film transited gradually.
出处
《低温工程》
CAS
CSCD
北大核心
2006年第6期32-34,共3页
Cryogenics
基金
国家863项目基金(2002AA306421)
电子科技大学校青年基金(JX05010)
关键词
激光辅助化学刻蚀
高温超导薄膜
钇钡铜氧
laser assisted chemical etching
high temperature superconductor film
YBCO