用于Gb级DRAM的TiO_2薄膜结构的研究

Study of the Structure of TiO 2 Thin Films for Gb Range DRAM

运用反应磁控溅射技术制备了应用于Ｇｂ级ＤＲＡＭ中的ＴｉＯ２薄膜。本文报道了对该薄膜进行Ｘ射线衍射结构分析所得到的详细结果。

TiO 2 thin films were prepared by reactive magnetron sputtering for gigabit (Gb) range DRAM applications. Their structures were studied by X-ray diffraction (XRD) in detail. The relation between the crystalline structure and the annealing conditions of TiO 2 films was described.