用于场发射阴极的磁控溅射金刚石薄膜的研究

The Study of Dimond Megnetron Sputtering Film for the use of Field Emission Cathode

用激光拉曼谱和原子力显微镜等现代分析手段研究了磁控溅射石墨靶制备的薄膜的结构和特性。结果表明：薄膜由金刚石相和石墨相组成，它们的相对含量取决于制备工艺参数，特别是沉积时的基体温度的影响尤为明显。薄膜表面呈现为密度很高的微尖锥。

Raman spectrometer and atom force microscope were employed to study and determine the structure and characteristics of the films prepared by the method of magnetron sputtering with graphite target. The results showed the film is composed of diamond phase and graphite phase. The relative concentrations of them were controlled by processing parameters, especially by substrate temperature. There are high density of micro-tips on the surface of the film, which would present a bright future in fabricating the cathode for a large area field emission display.