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A Study of the Aging of a-Al_2O_3 Dielectric Material in DBD Plasma

A Study of the Aging of a-Al_2O_3 Dielectric Material in DBD Plasma
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摘要 The performance of dielectric material is a key factor against a long time action in dielectric barrier discharge (DBD) plasma. In this study, the aging of the Al2O3 dielectric material was studied by the Atomic Force Microscope (AFM), X-ray Photoelectron spectrum (XPS) and Auger electron spectrum (AES) methods. The results showerd that the performance of the dielectric does not descend after an 1000 h aging experiment. Therefore the thin dielectric layers of α-Al2O3 porcelain with a purity above 99% can sustain a long time action of DBD plasma and form gas ionization discharges steadily. The performance of dielectric material is a key factor against a long time action in dielectric barrier discharge (DBD) plasma. In this study, the aging of the Al2O3 dielectric material was studied by the Atomic Force Microscope (AFM), X-ray Photoelectron spectrum (XPS) and Auger electron spectrum (AES) methods. The results showerd that the performance of the dielectric does not descend after an 1000 h aging experiment. Therefore the thin dielectric layers of α-Al2O3 porcelain with a purity above 99% can sustain a long time action of DBD plasma and form gas ionization discharges steadily.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2006年第6期693-696,共4页 等离子体科学和技术(英文版)
基金 supported by National Natural Science Foundation of China(No.60371035) Special Prophase Project on Basic Research of National Commission of Science and Technology(No.2004ccA06300) Project of Social Development of Dalian City(No.2004B3SF181)
关键词 Al2O3 porcelain dielectric material DBD dielectric barrier discharge Al2O3 porcelain, dielectric material, DBD, dielectric barrier discharge
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参考文献13

  • 1Kogelschatz Ulrich. 2002, IEEE Transactions on Plasma Science, 30:1400
  • 2Xu Xueji, Chu Dingchang. Gas discharge physics.Shanghai: Fudan University Press, 1996, 309
  • 3Wang Yu, Liu Changjun, Zhang Yueping. 2005,Plasma Science and Technology, 7:2839
  • 4Mcadams R. 2001, Journal of Physics D: Applied Physics, 34:2810
  • 5Mounir Laroussi. 2002, IEEE Transactions on Plasma Science, 30:1409
  • 6Kyung Cheol Choi, Rhee Byung-Jun, Lee Ho-Nyeon.2003, IEEE Transactions on Plasma Science, 31:329
  • 7Xu Xueji. 2001, Thin Solid Films, 390:237
  • 8Gibalor V I, Pietsch G J. 2000, Journal of Physics D:Applied Physics, 33:2618
  • 9Bibinov N K, Fateev A A. 2001, Journal of Physics D:Applied Physics, 34:1819
  • 10Bai Xiyao, Zhang Zhitao, Bai Mindong, et al. 2002,Chinese Science Bulletin, 47:529

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