光刻技术在整体式层板催化剂床研究中的应用

Application of photoetching in the integral catalyst bed

采用自主设计研制的高精度双面自对准光刻模具和标准MEMS光刻工艺技术研制出整体式层板催化剂床板片,简要介绍了光刻工艺原理、工艺流程和工艺过程。光刻加工出的板片满足设计要求,板片经过电镀和真空扩散焊接工艺形成了整体式催化剂床,该床成功地通过了热点火试车。催化剂床床载为16.5g/(cm2·s),分解效率为97%,室压粗糙度小于2%。

This paper introduced principle, flow, process of catalytic platelets ofphotoetching in the integral catalyst bed with high precision mould of dual-face self-aligner and standard MEMS photoetching technology. The catalytic platelets with photoetching satisfied the design requirement. The platelets became an integral catalyst bed through electroplating and vacuum diffusing welding technology. The catalyst bed load is 16.5g/cm^2 .s, the decomposition rate is 97%, and the roughness of the chamber is less than 2%. The Integral catalyst bed has passed hot test successfully. The results show that the techniaue of photoetching for manufacturing catalytic platelets is viable and reliable.