用于软刻蚀复型及转印前后形貌比较的反向重定位AFM成像方法

Reverse reposition imaging technique of AFM used to compare the topography of the master,stamp and the pattern in soft lithography

软刻蚀技术运用聚二甲基硅氧烷(Poly dimethylsiloxane,PDMS)等聚合物材料制备弹性图章,并用制备好的图章转印图形结构至特定基底。在很多情况下需对模板和弹性图章、图章与转印图形同一位置的形貌进行表征。基于原子力显微镜观测的反向重定位技术提供了一种微观区域内对二维平面互为镜像关系的两种样品的原位对比观测方法。本文利用坐标实时显示的程控高精度样品台系统,联合使用非对称表面标记及坐标镜像复制的定位法,实现了对样品的精确反向重定位成像。

Based on the elastic stamp made of polymer material such as （Poly dimethyhiloxane）PDMS, soft lithography replicated the mold by the stamp and translated the pattern of the stamp into the special substrate. In most cases, it needs to show the topograph features of the mold as well as the corresponding reverse position of the replica in soft lithography. Reverse reposition imaging technique of AFM （atomic force microscopy） provides an observing method to compare the difference between the master and the replica at the corresponding position in microscale. In this paper, it has been developed an accurate reverse reposition AFM imaging technique by simple asymmetry mark in surface on AFM system, which equipped with a program-controlled high resolution sample stage. With the advantage of the sample stage system, it was achieved the real-time displaying surface mark coordinates of the master and the replica. The experiment results showed that the replica reversed position corresponding to the master can be relocated easily and efficiently.