摘要
反应磁控溅射广泛应用于制备光学薄膜。分析了高阈值激光反射膜膜层材料的选择及膜系设计,比较了目前制备高阈值激光反射膜的几种常用方法。重点论述了反应磁控溅射制备高阈值激光反射膜需要解决的两个问题:工作点的选择及控制方法;反应磁控溅射中的打火、靶中毒及阳极消失。并且提出了相应的解决方案。阐述了影响激光反射膜损伤阈值的因素以及反应磁控溅射制备高阈值激光反射膜的优势。
Reactive magnetic sputtering （RMS） is widely used in optical coating preparation. The material choosing and coating designing are discussed in this paper. At the same time, several methods for laser reflective film preparation are compared. Two kinds of problem should be solved when preparing laser reflective film by RMS. First is how to choose and control the work point. Second is how to deal with arcing, target poison and disappearing anode. The factors that affect the damage threshold and the advantage of RMS in laser reflective film preparation are also discussed.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2006年第F11期309-311,共3页
Materials Reports
基金
中国工程物理研究院面上基金资助项目
