Nd:YAG脉冲激光氧化Cr膜的微观表面

Surface microstructure of Cr film by Nd:YAG pulsed laser oxidation

利用SEM、FESEM、AFM和XRD对Nd:YAG脉冲激光氧化Cr膜的微观结构进行了分析。在较小的激光能量作用下,所得到的氧化物薄膜均匀生长;当激光能量较高时,氧化物薄膜呈小丘状生长模式。薄膜表面形成的纳米尺寸的楔型晶界将对下一步的刻蚀产生不良影响,这是由于较低温度下进行的激光氧化会引起较低的扩散速率和初始应力释放。小丘状氧化物生长是在较高激光能量下较高温度使Cr离子向外扩散的结果。

The surface microstructure of Cr films oxidated by Nd:YAG pulsed laser was studied using a combination of SEM,FESEM,AFM and XRD.The oxide growth is nearly homogeneous by laser irradiation at the lower power density but it presents hill-like growth mode by the laser irradiation at the higher power density.The formation of the nano-sized thermal groove boundary that is harmful to the next processing step of etching was considered as the relaxation of the initial tensile stress in Cr film and the lower diffusion rate during laser oxidation at the lower temperature.The hill-like oxide growth is due to the rapid outward diffusion of Cr ions by laser oxidation at high power density induced high temperature.