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SiC MESFET微波功率器件的研制(英文) 被引量:1

Fabrication of SiC MESFETs for Microwave Power Applications
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摘要 利用本实验室生长的4H-SiC外延材料开展了SiC微波功率器件的研究.通过对欧姆接触和干法刻槽工艺的优化,研制出高性能的SiCMESFET.利用1mm栅宽SiCMESFET制成的微波功率放大器在2GHz64V工作时,连续波输出功率达4·09W,功率增益为9·3dB,PAE为31·3%.文中还给出了SiC功率放大器在微波大信号工作时的稳定性的初步测试结果. 4H-SiC MESFETs are fabricated on semi-insulating SiC substrates. Key processes are optimized to obtain better device performance. A microwave power amplifier is demonstrated from a 1mm SiC MESFET for S band operation. When operated at a drain voltage of 64V, the amplifier shows an output power of 4.09W, a gain of 9.3dB,and a power added efficiency of 31.3%.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2007年第1期10-13,共4页 半导体学报(英文版)
关键词 碳化硅 MESFET 微波 功率放大器 4H-SiC MESFET microwave power amplifier
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参考文献6

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同被引文献6

  • 1陈刚,李哲洋,柏松,任春江.采用场板和B^+离子注入边缘终端技术的Ti/4H-SiC肖特基势垒二极管(英文)[J].Journal of Semiconductors,2007,28(9):1333-1336. 被引量:2
  • 2ZHANG J,FORSBERG U,ISACSON Met al.Growth characteristics of SiCin a hot-wall CVDreactor with rotation. Journal of Materials Science . 2002
  • 3HARADA S,NAKAYAMA K,SASAKI M,et al.Uni-formity improvement in SiCepitaxial growth by using Si-con-densation. Journal of Materials Science . 2004
  • 4SARTEL C,BLUE J M,SOULI RE V,et al.Characte-rization of homoepitaxial4H-SiC layer grown from silane/propane. Materials Science Forum . 2003
  • 5BURK A A,O’LOUGHLI N MJ,PAISLEY M,et al.SiC warm-wall planetary VPE growth on multiple100-mm diameter wafers. Materials Science Forum . 2006
  • 6Saitoh H,Ki moto T,Matsunami H.Uniformity i mprovement in SiCepitaxial growth by horizontal hot-wall CVD. Materials Science Forum . 2003

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