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金刚石膜的内应力研究 被引量:2

The Investagation in Stress of Diamond Film
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摘要 采用微波PCVD方法在单晶硅片上制备出了金刚石膜.利用拉曼光谱和X射线射三行射(XRD)研究了不同甲烷浓度对在硅基底上沉积金刚石膜的内应力的影响,同时用XRD研究,抛光对于自支撑金刚石膜的宏观应变和微观应变的影响. Diamond film was synthesized on signal crystal Si substrate with different methane concentration by microwave PCVD method. The effect of stress was characterized using Laman spectrum and X - ray diffraction (XRD). The macroscopical and microcosmic strain of diamond film from surface polishing was studied.
出处 《吉林师范大学学报(自然科学版)》 2006年第4期10-12,共3页 Journal of Jilin Normal University:Natural Science Edition
关键词 金刚石膜 甲烷浓度 内应力 diamond film, methane concentration, stress
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参考文献3

  • 1T.R.Anthony.Stresses generated by impurities in diamond[J],Diamond and Related Materials 1995,4:1346-1352
  • 2J.Michler,Y.yon Kaenel,J.Stiegler,and E.Blank.Complementary application of electron microscopy and micro-Raman spectroscopy for microstructure,stress,and bonding defect investigation of heteroepitaxial chemical vapor deposited diamond films[J].Appl.Phys.1998,83(1):187~ 196
  • 3Cheng Tzu Kuo,Chii Ruey Lin,How Min Lie.Origins of the residual stress in CVD diamond films[J].Thin Solid Films 1996,290:254-259

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